IMEC’s ASML XT:1250i step-and-scan system has been upgraded with state-of-the-art hardware last month. The first exposures show excellent performance in three key areas: improved CD uniformity across the wafer, improved overlay numbers up to values comparable to dry 193nm lithography, and a spectacular reduction in patterned defectivity.

At the second International Symposium on Immersion Lithography, IMEC presented the first conclusive exposure results on its recently upgraded ASML XT:1250i immersion lithography tool:
· CD uniformity across the wafer was about two times better as compared with results obtained with the first generation immersion hardware. This is due to scanning over the edge with better focus control.
· Overlay performance was improved to comparable numbers as dry 193nm lithography, thanks to the new ASML stage design.
· Defectivity data showed a spectacular reduction in number of defects, going down to 0.037 defects/cm².

These results were obtained in the framework of the IMEC Industrial Affiliation Program on immersion lithography, which unites more than 30 major players in the field of immersion lithography. [See also news release: http://www.imec.be/wwwinter/mediacenter/en/ARRM2004_Immersion.shtml]

"Our strategic partnership with ASML is a cornerstone of the IMEC Industrial Affiliation Program on immersion lithography," said Luc Van den hove, Vice President Silicon Process and Device Technology. "When the program started one year ago we were able to provide our partners access to one of the first full-field step-and-scan systems from ASML. We are very proud that we can show our partners these unique and very positive results obtained on the upgraded system. They prove that the major critical issues for immersion lithography can be overcome making immersion a viable and manufacturable technology for the 45nm node."
"This IMEC Industrial Affiliation Program marks significant progress in 193nm immersion lithography," said Martin van den Brink, ASML Executive Vice President, Marketing and Technology. "Together with our program partners, we see results that demonstrate the technology leadership of ASML immersion systems."

For more information:

Katrien Marent
Corporate Communication Manager
IMEC, Kapeldreef 75
B- 3001 Leuven, Belgium
Tel +32 16 28 18 80 Fax +32 16 28 16 37
Email: Katrien.Marent@imec.be